Ms. Joyce A. Lowes Profile

Joyce A. Lowes

at Brewer Science Inc

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 9 April 2024 Presentation + Paper

Lithography performance improvement of MOR by underlayers

Si Li, Xinlin Lu, Stephen Grannemann, Daniel Sweat, Kelsey Brakensiek, Pengtao Lu, Joyce Lowes, Vandana Krishnamurthy, Veerle Van Driessche, Douglas Guerrero

Proceedings Volume 12957, 1295715 (2024) https://doi.org/10.1117/12.3010887

KEYWORDS: Polymers, Film thickness, Lithography, Extreme ultraviolet lithography, Semiconducting wafers, Coating, Tin, Silicon, Diffusion

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Proceedings Article | 9 April 2024 Poster + Paper

Understanding and improving performance of 14-nm HP EUV lithography via rational design of materials

Si Li, Daniel Sweat, Xinlin Lu, Kelsey Brakensiek, Pengtao Lu, Joyce Lowes, Veerle Van Driessche, Douglas Guerrero

Proceedings Volume 12957, 129571T (2024) https://doi.org/10.1117/12.3010498

KEYWORDS: Polymers, Extreme ultraviolet lithography, Line width roughness, Lithography, Adhesives, Adhesion, Extreme ultraviolet

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Proceedings Article | 1 May 2023 Presentation + Paper

Novel assist layers to enhance EUV lithography performance of photoresists on different substrates

Si Li, Joyce Lowes, Ruimeng Zhang, Ming Luo, Kelsey Brakensiek, Veerle Van Driessche, Douglas Guerrero

Proceedings Volume 12498, 124980N (2023) https://doi.org/10.1117/12.2658529

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Coating, Coating thickness, Silicon, Photoresist materials, Adhesion, Line width roughness, Resistance, Adhesives

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Proceedings Article | 25 May 2022 Paper

Suppressing stochastic interaction to improve EUV lithography

Zhimin Zhu, Joyce Lowes, Shawn Ye, Zhiqiang Fan, Tim Limmer

Proceedings Volume 12055, 120550P (2022) https://doi.org/10.1117/12.2614289

KEYWORDS: Stochastic processes, System on a chip, Lithography, Extreme ultraviolet lithography, Diffusion, Optical lithography, Extreme ultraviolet, Photoresist processing, Printing, Optical imaging

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Proceedings Article | 25 May 2022 Presentation + Paper

Realization of sub-30-pitch EUV lithography through the application of functional spin-on glass

Yichen Liang, Kelsey Brakensiek, Joyce Lowes, Andrea Chacko, Ruimeng Zhang, Veerle Van Driessche, Xiaolong Lang, Jaishankar Kasthuri, Ming Luo, Douglas Guerrero

Proceedings Volume 12055, 120550A (2022) https://doi.org/10.1117/12.2610985

KEYWORDS: Extreme ultraviolet lithography, Adhesives, Polymers, Etching, Plasma etching, Optical lithography, Semiconducting wafers

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Proceedings Article | 23 March 2020 Presentation + Paper

Rigorous vase data fitting for ultrathin films

Zhimin Zhu, Joyce Lowes, Shawn Ye, Zhiqiang Fan, Darin Collins, James Lamb, Tim Limmer

Proceedings Volume 11327, 113270J (2020) https://doi.org/10.1117/12.2551934

KEYWORDS: Algorithm development, Semiconducting wafers, Polymer thin films, Polymers, Software development, Optics manufacturing, Scattering, Thin films, Lithography, Coating

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Proceedings Article | 23 March 2020 Presentation + Paper

Are surfaces of silicon hardmasks adaptive?

Xianggui (Shawn) Ye, Joyce Lowes, Zhimin Zhu, Richard Daugherty, Zhiqiang Fan, James Lamb, Tim Limmer, Srikanth Kommu

Proceedings Volume 11326, 1132616 (2020) https://doi.org/10.1117/12.2552929

KEYWORDS: Photoresist materials, Interfaces, Lithography, Silicon, Semiconducting wafers, Computer simulations, Multilayers, Surface properties

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Proceedings Article | 3 May 2017 Presentation

Molecular force modeling of lithography (Conference Presentation)

Zhimin Zhu, Amanda Riojas, Trisha May, Joyce Lowes, Nickolas Brakensiek, Daniel Sullivan

Proceedings Volume 10147, 101470E (2017) https://doi.org/10.1117/12.2257363

KEYWORDS: Optical lithography, Current controlled current source, Computed tomography, Reflectivity, Lithography

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Proceedings Article | 16 April 2011 Paper

Implementation of KrF DBARCs for implant applications on advanced lithography nodes

Joyce Lowes, Alice Guerrero, Michael Weigand, Carlton Washburn, Charlyn Stroud, Shalini Sharma, David Torres, Mark Slezak, Gary Dabbagh, Cherry Tang

Proceedings Volume 7972, 797227 (2011) https://doi.org/10.1117/12.879464

KEYWORDS: Picosecond phenomena, Photoresist materials, Lithography, Semiconducting wafers, Critical dimension metrology, Photoresist developing, Polymers, Silicon, Reflectivity, Photomasks

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Proceedings Article | 31 March 2010 Paper

Photoresist-induced development behavior in DBARCs

Jim Meador, Alice Guerrero, Joyce Lowes, Charlyn Stroud, Brandy Carr, Anwei Qin, Carlton Washburn, Ramil-Marcelo Mercado

Proceedings Volume 7639, 763926 (2010) https://doi.org/10.1117/12.846927

KEYWORDS: Lithography, Photoresist materials, Silicon, Photoresist developing, Diffusion, Polymers, Lithographic illumination, Scanning electron microscopy, Scanners, Photography

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Proceedings Article | 26 March 2010 Paper

Advantages of BARC and photoresist matching for 193-nm photosensitive BARC applications

Joyce Lowes, Victor Pham, Jim Meador, Charlyn Stroud, Ferdinand Rosas, Ramil-Marcelo Mercado, Mark Slezak

Proceedings Volume 7639, 76390K (2010) https://doi.org/10.1117/12.846608

KEYWORDS: Picosecond phenomena, Photoresist materials, Photoresist developing, Polymers, Lithography, Diffusion, Semiconducting wafers, Standards development, Chemistry, Quenching (fluorescence)

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Proceedings Article | 1 April 2009 Paper

Improving the performance of light-sensitive developer-soluble anti-reflective coatings by using adamantyl terpolymers

Jim Meador, Joyce Lowes, Charlyn Stroud, Sherilyn Thomas, Yilin Qiu, Ramil-Marcelo Mercado, Victor Pham, Mark Slezak

Proceedings Volume 7273, 727312 (2009) https://doi.org/10.1117/12.813783

KEYWORDS: Lithography, Photoresist materials, Photoresist developing, Polymers, Scanning electron microscopy, Antireflective coatings, Interferometers, Polymer thin films, Electroluminescence, Bandpass filters

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Proceedings Article | 4 December 2008 Paper

Acid-degradable hyperbranched polymer and its application in bottom anti-reflective coatings

Ramil-Marcelo Mercado, Hao Xu, Joyce Lowes, Jim Meador, Douglas Guerrero

Proceedings Volume 7140, 71402W (2008) https://doi.org/10.1117/12.804743

KEYWORDS: Polymers, Photoresist developing, Polymer thin films, Photoresist materials, Lithography, Coating, Molecules, Bottom antireflective coatings, Electroluminescence, Etching

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Proceedings Article | 15 April 2008 Paper

Dual-layer dye-filled developer-soluble BARCs for 193-nm lithography

Jim Meador, Carol Beaman, Charlyn Stroud, Joyce Lowes, Zhimin Zhu, Douglas Guerrero, Ramil-Marcelo Mercado, David Drain

Proceedings Volume 6923, 69232W (2008) https://doi.org/10.1117/12.772793

KEYWORDS: Polymers, Lithography, Photoresist developing, Photoresist materials, Electroluminescence, Diffractive optical elements, Reflectivity, Polymer thin films, Optical properties, Scanning electron microscopy

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Proceedings Article | 26 March 2008 Paper

Anti-reflective coating for multipatterning lithography

Douglas Guerrero, Steve Gibbons, Joyce Lowes, Ramil Mercado

Proceedings Volume 6923, 69230X (2008) https://doi.org/10.1117/12.772827

KEYWORDS: Photoresist processing, Etching, Image processing, Optical lithography, Semiconducting wafers, Oxygen, Lithography, Printing, Argon, Scanning electron microscopy

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Proceedings Article | 30 March 2007 Paper

A novel approach to developer-soluble anti-reflective coatings for 248-nm lithography

Ramil-Marcelo Mercado, Joyce Lowes, Carlton Washburn, Douglas Guerrero

Proceedings Volume 6519, 65192X (2007) https://doi.org/10.1117/12.712313

KEYWORDS: Polymers, Lithography, Photoresist developing, Photoresist materials, Electroluminescence, Reflectivity, Antireflective coatings, Critical dimension metrology, Silicon, Light sources

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Proceedings Article | 29 March 2006 Paper

Development of 193-nm wet BARCs for implant applications

Jim Meador, Carol Beaman, Joyce Lowes, Carlton Washburn, Ramil Mercado, Mariya Nagatkina, Charlyn Stroud

Proceedings Volume 6153, 61532P (2006) https://doi.org/10.1117/12.657597

KEYWORDS: Reflectivity, Photoresist materials, Silicon, Lithography, Polymers, Electroluminescence, Chemistry, Critical dimension metrology, Photoresist developing, Absorbance

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Proceedings Article | 14 May 2004 Paper

Bottom anti-reflective coatings (BARCs) for 157-nm lithography

Liu He, Rama Puligadda, Joyce Lowes, Michael Rich

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535245

KEYWORDS: Lithography, Polymers, Reflectivity, Chromophores, Absorbance, Etching, Coating, Bottom antireflective coatings, Prototyping, Photoresist materials

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Proceedings Article | 26 June 2003 Paper

Bottom antireflective coatings (BARCs) for 157-nm lithography

Liu He, Rama Puligadda, Joyce Lowes, Michael Rich

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485334

KEYWORDS: Reflectivity, Lithography, Etching, Polymers, Coating, Refractive index, Bottom antireflective coatings, Photoresist processing, Silicon, Prototyping

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Showing 5 of 19 publications

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