Thermal analysis of EUV mask under inspection laser beam irradiation

Yasushi Nishiyama; Tsuyoshi Amano; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga

doi:10.1117/12.729030

15 May 2007 Thermal analysis of EUV mask under inspection laser beam irradiation

Yasushi Nishiyama, Tsuyoshi Amano, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga

Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66073B (2007) https://doi.org/10.1117/12.729030
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan

Abstract

Temperature of EUV mask surface under inspection laser beam irradiation is modeled and simulated. Various conditions including beam power, beam size, irradiation time, and wavelength are considered. Calculation program for this study has two components: at first, average power passing through the film is calculated from optical properties of materials, and then heat transfer equations are solved using finite difference method. Temperature of multilayer below the absorber depends on the optical properties of absorber film surface. At the wavelength of deep ultraviolet region, temperature of multilayer below the absorber rises higher than in the temperature of multilayer directly exposed to the beam.

Citation Download Citation

Yasushi Nishiyama, Tsuyoshi Amano, Hiroyuki Shigemura, Tsuneo Terasawa, and Osamu Suga "Thermal analysis of EUV mask under inspection laser beam irradiation", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66073B (15 May 2007); https://doi.org/10.1117/12.729030

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