Paper
9 January 2008 Sensing gap reconfigurable capacitive type MEMS accelerometer
Chang Han Je, Myunglae Lee, Sunghye Jung, Sungsik Lee, Gunn Hwang, Changauck Choi
Author Affiliations +
Proceedings Volume 6800, Device and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology IV; 68001Z (2008) https://doi.org/10.1117/12.759392
Event: SPIE Microelectronics, MEMS, and Nanotechnology, 2007, Canberra, ACT, Australia
Abstract
A novel sensing gap reconfigurable capacitive type MEMS accelerometer with high sensitivity and high resolution is designed, fabricated and characterized. The present MEMS accelerometer is fabricated by using simple SOI process-DRIE. However, conventional Silicon on Insulator (SOI) process is hard to make patterns which is smaller than 1 um because of its high aspect ratio and ICP etching error such as loading-effect and under-cutting. So we have adopted a simple idea of the MEMS actuator-stopper system to modulate the sensing gap precisely. Unlike previous capacitive type MEMS accelerometer which has an anchored reference comb electrodes, the proposed accelerometer has a movable reference comb with MEMS electrostatic actuators and stoppers. By simply applying DC bias to MEMS actuators, the reference comb electrode is moved to the sensing comb structure until the actuators contacting the stoppers. The gap between sensing comb fingers and reference comb fingers is reduced by the gap between actuators and stoppers. In this paper, the initial sensing gap is 1.5um and it reduced to 0.5um, when working. Then, the overall capacitance and sensitivity is simple increased. The capacitance is increased from 3.47pF at the OFF state to 5.35pF at the ON state by applying 2V DC bias.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chang Han Je, Myunglae Lee, Sunghye Jung, Sungsik Lee, Gunn Hwang, and Changauck Choi "Sensing gap reconfigurable capacitive type MEMS accelerometer", Proc. SPIE 6800, Device and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology IV, 68001Z (9 January 2008); https://doi.org/10.1117/12.759392
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Cited by 3 scholarly publications.
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KEYWORDS
Microelectromechanical systems

Electrodes

Actuators

Capacitance

Sensors

Deep reactive ion etching

Oxides

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