Research on structural properties of ZnO thin films deposited on different substrates

Xi-ming Chen; Yu-ming Xue; Chun-hua Yu; Jun-Ping Zhang; Chang-feng Fu; Xia Chen; Hua-peng Li

doi:10.1117/12.759269

26 November 2007 Research on structural properties of ZnO thin films deposited on different substrates

Xi-ming Chen, Yu-ming Xue, Chun-hua Yu, Jun-Ping Zhang, Chang-feng Fu, Xia Chen, Hua-peng Li

Proceedings Volume 6829, Advanced Materials and Devices for Sensing and Imaging III; 68290O (2007) https://doi.org/10.1117/12.759269
Event: Photonics Asia 2007, 2007, Beijing, China

Abstract

In this article, ZnO thin films were deposited on different substrates, including glass, p-Si (100) and n-Si (111) by radio frequency (RF) magnetron sputtering technique. By changing substrate temperature and sputtering power, the influence of the sputtering rate was studied on structural properties of ZnO films. The film structural properties of the crystal phase, the surface morphology and the thickness were characterized by D/MAX-2200 XRD, JEOL JSM-6700F ESEM and AMBIOS XP-2 step meter respectively. The results showed that the films deposited on p-Si (100) substrates were preferred c-axis orientations, and their surfaces were smooth and compact when the substrate temperature was 300 Centigrade degrees.

Citation Download Citation

Xi-ming Chen, Yu-ming Xue, Chun-hua Yu, Jun-Ping Zhang, Chang-feng Fu, Xia Chen, and Hua-peng Li "Research on structural properties of ZnO thin films deposited on different substrates", Proc. SPIE 6829, Advanced Materials and Devices for Sensing and Imaging III, 68290O (26 November 2007); https://doi.org/10.1117/12.759269

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