Ionic photo-acid generators containing functionalized semifluorinated sulfonates for high-resolution lithography

Yi Yi; Ramakrishnan Ayothi; Christopher K. Ober; Wang Yueh; Heidi Cao

doi:10.1117/12.772880

26 March 2008 Ionic photoacid generators containing functionalized semifluorinated sulfonates for high-resolution lithography

Yi Yi, Ramakrishnan Ayothi, Christopher K. Ober, Wang Yueh, Heidi Cao

Author Affiliations +

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69231B (2008) https://doi.org/10.1117/12.772880
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

To meet the challenges for resist materials raised by high resolution lithography technologies, tailor-made photoacid generators (PAGs) with controlled acid diffusion and improved miscibility with polymers are very important. We have developed new ionic PAGs containing functionalized semifluorinated sulfonates. These PAGs have excellent solubility in polymer matrices and common organic solvents, high thermal stability, high acid strength and low volatility of the generated acids, and make them attractive PAGs for high resolution lithography. In this contribution, the preparation and characterization of several new ionic PAGs, the influence of the host matrix on PAG properties, and a comparison of their lithographic performance are presented. Specifically their lithographic performance at EUV wavelength is discussed.

Citation Download Citation

Yi Yi, Ramakrishnan Ayothi, Christopher K. Ober, Wang Yueh, and Heidi Cao "Ionic photoacid generators containing functionalized semifluorinated sulfonates for high-resolution lithography", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231B (26 March 2008); https://doi.org/10.1117/12.772880

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