Structural, electrical, and optical characterization of nanocrystalline diamond films deposited by HFCVD method

Yan Jin; Linjun Wang; Jianmin Liu; Jian Huang; Run Xu; Weimin Shi; Yiben Xia

doi:10.1117/12.792389

11 March 2008 Structural, electrical, and optical characterization of nanocrystalline diamond films deposited by HFCVD method

Yan Jin, Linjun Wang, Jianmin Liu, Jian Huang, Run Xu, Weimin Shi, Yiben Xia

Author Affiliations +

Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 698417 (2008) https://doi.org/10.1117/12.792389
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China

Abstract

The structure, electrical and optical properties of nano-crystalline diamond (NCD) films deposited by hot-filament chemical vapor deposition (HFCVD) method, are reported. The influence of the carbon concentration during the film deposition on the Raman scattering, optical gap, optical constants (n and k) and dark-current is investigated. Under a higher carbon concentration during deposition, the NCD film obtained with a smaller grain size, has a lower optical gap, refractive index and electrical resistivity. These changes with the carbon concentration are attributed to the high amount of sp² bonded carbons and other non-diamond phase, which is confirmed by Raman scattering measurements.

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Yan Jin, Linjun Wang, Jianmin Liu, Jian Huang, Run Xu, Weimin Shi, and Yiben Xia "Structural, electrical, and optical characterization of nanocrystalline diamond films deposited by HFCVD method", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 698417 (11 March 2008); https://doi.org/10.1117/12.792389

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