Collecting EUV mask images through focus by wavelength tuning

Kenneth A. Goldberg; Iacopo Mochi; Sungmin Huh

doi:10.1117/12.824433

18 March 2009 Collecting EUV mask images through focus by wavelength tuning

Kenneth A. Goldberg, Iacopo Mochi, Sungmin Huh

Proceedings Volume 7271, Alternative Lithographic Technologies; 72713N (2009) https://doi.org/10.1117/12.824433
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Using an extreme-ultraviolet (EUV) microscope to produce high-quality images of EUV reticles, we have developed a new wavelength tuning method to acquire through-focus data series with a higher level of stability and repeatability than was previously possible. We utilize the chromatic focal-length dependence of a diffractive Fresnel zoneplate objective lens, and while holding the mask sample mechanically still, we tune the wavelength through a narrow range, in small steps. In this paper, we demonstrate the method and discuss the the relative advantages that this data collection technique affords.

Citation Download Citation

Kenneth A. Goldberg, Iacopo Mochi, and Sungmin Huh "Collecting EUV mask images through focus by wavelength tuning", Proc. SPIE 7271, Alternative Lithographic Technologies, 72713N (18 March 2009); https://doi.org/10.1117/12.824433

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