Uncertainty and sensitivity analysis and its applications in OCD measurements

Pedro Vagos; Jiangtao Hu; Zhuan Liu; Silvio Rabello

doi:10.1117/12.814363

23 March 2009 Uncertainty and sensitivity analysis and its applications in OCD measurements

Pedro Vagos, Jiangtao Hu, Zhuan Liu, Silvio Rabello

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72721N (2009) https://doi.org/10.1117/12.814363
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

This article describes an Uncertainty & Sensitivity Analysis package, a mathematical tool that can be an effective time-shortcut for optimizing OCD models. By including real system noises in the model, an accurate method for predicting measurements uncertainties is shown. The assessment, in an early stage, of the uncertainties, sensitivities and correlations of the parameters to be measured drives the user in the optimization of the OCD measurement strategy. Real examples are discussed revealing common pitfalls like hidden correlations and simulation results are compared with real measurements. Special emphasis is given to 2 different cases: 1) the optimization of the data set of multi-head metrology tools (NI-OCD, SE-OCD), 2) the optimization of the azimuth measurement angle in SE-OCD. With the uncertainty and sensitivity analysis result, the right data set and measurement mode (NI-OCD, SE-OCD or NI+SE OCD) can be easily selected to achieve the best OCD model performance.

Citation Download Citation

Pedro Vagos, Jiangtao Hu, Zhuan Liu, and Silvio Rabello "Uncertainty and sensitivity analysis and its applications in OCD measurements", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72721N (23 March 2009); https://doi.org/10.1117/12.814363

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