Dr. Jiangtao Hu Profile

Dr. Jiangtao Hu

at Onto Innovation Inc

SPIE Involvement:

Author

Publications (23)

SPIE Journal Paper | 16 October 2014

Scatterometry performance enhancement by holistic approach

Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsehpour, Holger Schroder, John Piggot

JM3, Vol. 13, Issue 04, 041406, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041406

KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

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Proceedings Article | 2 April 2014 Paper

Paper

Scatterometry performance improvement by parameter and spectrum feed-forward

Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsepour

Proceedings Volume 9050, 90502T (2014) https://doi.org/10.1117/12.2046639

KEYWORDS: Reactive ion etching, Scatterometry, Critical dimension metrology, Metrology, Magnetism, Manufacturing, Photomasks, Etching, Measurement devices, Semiconducting wafers

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Proceedings Article | 2 April 2014 Paper

Paper

Enhanced optical CD metrology by hybridization and azimuthal scatterometry

Shahin Zangooie, Jie Li, Karthik Boinapally, Peter Wilkens, Avraham Ver, Babak Khamsepour, Holger Schroder, John Piggot, Sanjay Yedur, Zhuan Liu, Jiangtao Hu

Proceedings Volume 9050, 90501G (2014) https://doi.org/10.1117/12.2046165

KEYWORDS: Scatterometry, Critical dimension metrology, Line edge roughness, Scatter measurement, Semiconducting wafers, Metrology, Reactive ion etching, Manufacturing, Ellipsometry, Data modeling

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Proceedings Article | 13 May 2013 Paper

Paper

Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors

Hock-Chun Chin, Bin Liu, Xingui Zhang, Moh-Lung Ling, Chan-Hoe Yip, Yongdong Liu, Jiangtao Hu, Yee-Chia Yeo

Proceedings Volume 8788, 87881R (2013) https://doi.org/10.1117/12.2020248

KEYWORDS: Scatterometry, Metrology, Germanium, Transistors, Molybdenum, Process control, Indium gallium arsenide, Spectroscopy, Scanning electron microscopy

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Proceedings Article | 10 April 2013 Paper

Paper

Scatterometry evaluation of focus-dose effects of EUV structures

Prasad Dasari, Oleg Kritsun, Jie Li, Catherine Volkman, Jiangtao Hu, Zhuan Liu

Proceedings Volume 8681, 86810T (2013) https://doi.org/10.1117/12.2012120

KEYWORDS: Critical dimension metrology, Scatterometry, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Metrology, Scanners, 3D modeling, Scanning electron microscopy, Ellipsometry

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Proceedings Article | 10 April 2013 Paper

Paper

Evaluating scatterometry 3D capabilities for EUV

Jie Li, Oleg Kritsun, Prasad Dasari, Catherine Volkman, Tom Wallow, Jiangtao Hu

Proceedings Volume 8681, 86810S (2013) https://doi.org/10.1117/12.2011675

KEYWORDS: Semiconducting wafers, Scatterometry, Metrology, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, 3D metrology, Neodymium, Spectroscopic ellipsometry, Lithography

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Proceedings Article | 10 April 2013 Paper

Paper

Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry

Hock-Chun Chin, Moh-Lung Ling, Bin Liu, Xingui Zhang, Jie Li, Yongdong Liu, Jiangtao Hu, Yee-Chia Yeo

Proceedings Volume 8681, 86813D (2013) https://doi.org/10.1117/12.2013413

KEYWORDS: Germanium, Scatterometry, Transmission electron microscopy, Scanning electron microscopy, Transistors, Metrology, Etching, Front end of line, 3D modeling

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Proceedings Article | 6 April 2012 Paper

Paper

Evaluating diffraction-based overlay

Jie Li, Asher Tan, JinWoo Jung, Gary Goelzer, Nigel Smith, Jiangtao Hu, Boo-Hyun Ham, Min-Cheol Kwak, Cheol-Hong Kim, Suk-Woo Nam

Proceedings Volume 8324, 83243A (2012) https://doi.org/10.1117/12.918706

KEYWORDS: Semiconducting wafers, Overlay metrology, Detection and tracking algorithms, Wafer testing, Wafer-level optics, Reflectivity, Oxides, Error analysis, Silicon, Precision measurement

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Proceedings Article | 5 April 2012 Paper

Paper

Faster diffraction-based overlay measurements with smaller targets using 3D gratings

Jie Li, Oleg Kritsun, Yongdong Liu, Prasad Dasari, Catherine Volkman, Jiangtao Hu

Proceedings Volume 8324, 83241I (2012) https://doi.org/10.1117/12.916747

KEYWORDS: Semiconducting wafers, Overlay metrology, 3D acquisition, 3D metrology, Finite element methods, Diffraction gratings, Time metrology, Spectroscopy, Reflectance spectroscopy, 3D modeling

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Proceedings Article | 5 April 2012 Paper

Paper

Scatterometry metrology challenges of EUV

Prasad Dasari, Jie Li, Jiangtao Hu, Zhuan Liu, Oleg Kritsun, Catherine Volkman

Proceedings Volume 8324, 83240M (2012) https://doi.org/10.1117/12.916006

KEYWORDS: Scatterometry, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Metrology, Semiconducting wafers, Double patterning technology, Cadmium, Optical lithography, Ellipsometry

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Proceedings Article | 20 April 2011 Paper

Paper

Metrology characterization of spacer double patterning by scatterometry

Prasad Dasari, Jie Li, Jiangtao Hu, Zhuan Liu, Oleg Kritsun, Catherine Volkman

Proceedings Volume 7971, 797111 (2011) https://doi.org/10.1117/12.879900

KEYWORDS: Scatterometry, Critical dimension metrology, Semiconducting wafers, Metrology, Double patterning technology, Etching, Process control, Scatter measurement, Reflectometry, Scanning electron microscopy

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Proceedings Article | 20 April 2011 Paper

Paper

Advancements of diffraction-based overlay metrology for double patterning

Jie Li, Oleg Kritsun, Yongdong Liu, Prasad Dasari, Ulrich Weher, Catherine Volkman, Martin Mazur, Jiangtao Hu

Proceedings Volume 7971, 79711Y (2011) https://doi.org/10.1117/12.879552

KEYWORDS: Overlay metrology, Double patterning technology, Reflectance spectroscopy, Detection and tracking algorithms, Time metrology, Semiconducting wafers, Diffraction, Diffraction gratings, Spectroscopy, Reflectometry

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SPIE Journal Paper | 1 October 2010

Scatterometry characterization of spacer double patterning structures

Prasad Dasari, Jiangtao Hu, Zhuan Liu, Asher Tan, Oleg Kritsun, Catherine Volkman, Christopher Bencher

JM3, Vol. 9, Issue 04, 041309, (October 2010) https://doi.org/10.1117/12.10.1117/1.3531999

KEYWORDS: Scatterometry, Critical dimension metrology, Double patterning technology, Semiconducting wafers, Etching, Reflectance spectroscopy, Metrology, Spectroscopy, Reflectometry, Lithography

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SPIE Journal Paper | 1 October 2010

Mueller matrix measurement of asymmetric gratings

Jie Li, Justin Hwu, Yongdong Liu, Silvio Rabello, Zhuan Liu, Jiangtao Hu

JM3, Vol. 9, Issue 04, 041305, (October 2010) https://doi.org/10.1117/12.10.1117/1.3514708

KEYWORDS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Nanoimprint lithography, Calibration, Spectroscopic ellipsometry, Scanning electron microscopy, Photoresist processing, Metrology, Polarization

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Proceedings Article | 2 April 2010 Paper

Paper

Scatterometry characterization of spacer double patterning structures

Prasad Dasari, Jiangtao Hu, Zhuan Liu, Asher Tan, Oleg Kritsun, Catherine Volkman, Chris Bencher

Proceedings Volume 7638, 76381J (2010) https://doi.org/10.1117/12.848518

KEYWORDS: Scatterometry, Critical dimension metrology, Double patterning technology, Semiconducting wafers, Etching, Metrology, Overlay metrology, Scatter measurement, Spectroscopy, Ellipsometry

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Proceedings Article | 2 April 2010 Paper

Paper

Advanced diffraction-based overlay for double patterning

Jie Li, Yongdong Liu, Prasad Dasari, Jiangtao Hu, Nigel Smith, Oleg Kritsun, Catherine Volkman

Proceedings Volume 7638, 76382C (2010) https://doi.org/10.1117/12.848516

KEYWORDS: Overlay metrology, Double patterning technology, Spectroscopic ellipsometry, Semiconducting wafers, Time metrology, Optical components, Metrology, Diffraction, Integrated circuits, Critical dimension metrology

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Proceedings Article | 11 December 2009 Paper

Paper

Optical critical dimension measurements for patterned media with 10's nm feature size

Yongdong Liu, Milad Tabet, Jiangtao Hu, Zhaoning Yu, Justin Hwu, Wei Hu, Sha Zhu, Gene Gauzner, Kim Lee, Shifu Lee

Proceedings Volume 7520, 75200H (2009) https://doi.org/10.1117/12.839523

KEYWORDS: Quartz, Scanning electron microscopy, Metrology, Critical dimension metrology, Atomic force microscopy, Ultraviolet radiation, Nanoimprint lithography, Lithography, Optical testing, Scanning transmission electron microscopy

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Proceedings Article | 11 December 2009 Paper

Paper

Scatterometry measurement of asymmetric gratings

Jie Li, Justin Hwu, Yongdong Liu, Silvio Rabello, Zhuan Liu, Jiangtao Hu

Proceedings Volume 7520, 75201B (2009) https://doi.org/10.1117/12.839821

KEYWORDS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Lithography, Scatter measurement, Critical dimension metrology, Spectroscopic ellipsometry, Photoresist processing, Calibration, Metrology

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Proceedings Article | 24 March 2009 Paper

Paper

Uncertainty and sensitivity analysis and its applications in OCD measurements

Pedro Vagos, Jiangtao Hu, Zhuan Liu, Silvio Rabello

Proceedings Volume 7272, 72721N (2009) https://doi.org/10.1117/12.814363

KEYWORDS: Silicon, Metrology, 3D modeling, Data modeling, Optimization (mathematics), 3D metrology, Silica, Reflectometry, Mathematical modeling, Neodymium

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Proceedings Article | 16 March 2009 Paper

Paper

Calibrating OPC model with full CD profile data for 2D and 3D patterns using scatterometry

Aasutosh Dave, Oleg Kritsun, Yunfei Deng, Kenji Yoshimoto, Jie Li, Jiangtao Hu

Proceedings Volume 7274, 727415 (2009) https://doi.org/10.1117/12.814955

KEYWORDS: Data modeling, 3D modeling, Scatterometry, Calibration, Optical proximity correction, 3D metrology, Critical dimension metrology, Lithography, Line edge roughness, Cadmium

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Proceedings Article | 9 November 2005 Paper

Paper

Scatterometry based CD and profile metrology of MoSi/quartz structures

Sanjay Yedur, Vi Vuong, Deepak Shivaprasad, T.P. Sarathy, Milad Tabet, Rahul Korlahalli, Jiangtao Hu

Proceedings Volume 5992, 59924I (2005) https://doi.org/10.1117/12.632304

KEYWORDS: Data modeling, Critical dimension metrology, Metrology, Reflectivity, Scatterometry, Photomasks, Optical properties, Oscillators, Reflectance spectroscopy, Statistical modeling

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Proceedings Article | 10 May 2005 Paper

Paper

Measurement of deep silicon trench profile using normal incidence optical CD metrology

Zhuan Liu, Xiaodong Zhang, Jiangtao Hu, D. Roy

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600121

KEYWORDS: Semiconducting wafers, Silicon, Critical dimension metrology, Scanning electron microscopy, Atomic force microscopy, Process control, Time metrology, Reflectivity, Metrology, Etching

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Proceedings Article | 2 June 2003 Paper

Paper

Novel diffraction-based spectroscopic method for overlay metrology

Weidong Yang, Roger Lowe-Webb, Silvio Rabello, Jiangtao Hu, Je-Yi Lin, John Heaton, Mircea Dusa, Arie den Boef, Maurits van der Schaar, Adolph Hunter

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483476

KEYWORDS: Overlay metrology, Diffraction, Diffraction gratings, Semiconducting wafers, Spectroscopy, Optical alignment, Imaging systems, Metrology, Error analysis, Optical design

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Showing 5 of 23 publications

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