Advanced testing requirements of diffractive optical elements for off-axis illumination in photolithography

John E. Childers; Tom Baker; Tim Emig; James Carriere; Marc D. Himel

doi:10.1117/12.827395

21 August 2009 Advanced testing requirements of diffractive optical elements for off-axis illumination in photolithography

John E. Childers, Tom Baker, Tim Emig, James Carriere, Marc D. Himel

Author Affiliations +

Proceedings Volume 7430, Laser Beam Shaping X; 74300S (2009) https://doi.org/10.1117/12.827395
Event: SPIE Optical Engineering + Applications, 2009, San Diego, California, United States

Abstract

The progress of immersion lithography toward the 22nm production node is putting more stringent requirements on the diffractive optics that are used for off-axis illumination. Tighter tolerances on pole balance, stray light, zeroth order, optical transmission, and matching of the far field output pattern to the design specification are in-turn requiring more accurate and repeatable optical testing. This paper will report on preliminary results from Tessera's new excimer diffractive optics test stand, including gauge capability and sources of variation, ending with a comparison of measurement capability to the required specifications.

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John E. Childers, Tom Baker, Tim Emig, James Carriere, and Marc D. Himel "Advanced testing requirements of diffractive optical elements for off-axis illumination in photolithography", Proc. SPIE 7430, Laser Beam Shaping X, 74300S (21 August 2009); https://doi.org/10.1117/12.827395

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