Roadmap for traceable calibration of a 5-nm pitch length standard

Donald A. Chernoff; David L. Burkhead

doi:10.1117/12.846628

1 April 2010 Roadmap for traceable calibration of a 5-nm pitch length standard

Donald A. Chernoff, David L. Burkhead

Proceedings Volume 7638, Metrology, Inspection, and Process Control for Microlithography XXIV; 763837 (2010) https://doi.org/10.1117/12.846628
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Production of objects with 5 to 25 nm width or pitch requires metrology with picometer-scale accuracy. We imaged a new 70-nm pitch standard by AFM and made it traceable to the international (SI) meter. We describe data capture and analysis procedures that produce metrology-quality results from general purpose AFMs and SEMs. We suggest that traceable pitch standards are most useful when the expanded uncertainty (k=2, 95% confidence) is less than ±1.33% for single pitch values and ±0.5% for mean pitch. We show a projected chain of comparisons (roadmap) leading to a 5-nm pitch standard with expanded uncertainty of 52 pm (1.04%) for single values and 16 pm (0.32%) for the mean value, significantly better than the target.

Citation Download Citation

Donald A. Chernoff and David L. Burkhead "Roadmap for traceable calibration of a 5-nm pitch length standard", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 763837 (1 April 2010); https://doi.org/10.1117/12.846628

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