E-beam direct write (EBDW) as complementary lithography

David Lam; Dave Liu; Ted Prescop

doi:10.1117/12.868485

29 September 2010 E-beam direct write (EBDW) as complementary lithography

David Lam, Dave Liu, Ted Prescop

Proceedings Volume 7823, Photomask Technology 2010; 78231C (2010) https://doi.org/10.1117/12.868485
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

193nm Optical lithography has powered the industry's growth for the last 10 years and multiple patterning is poised to extend 193nm even further. There is a growing trend in Logic design for manufacturing, with high-volume manufacturing (HVM) firms adopting a layout style using unidirectional single-pitch straight lines in poly and metal layers. These layouts lend themselves to a complementary lithography approach. First, unidirectional lines are patterned with Optical lithography. Second, these lines are "cut" to form the desired layout. In this paper, we present EBDW as a complement to optical lithography for line-cutting. We show how e-beam multiple-column architecture, optimized for line-cutting, is the best for patterning critical layers at advanced nodes as Complementary Lithography.

Citation Download Citation

David Lam, Dave Liu, and Ted Prescop "E-beam direct write (EBDW) as complementary lithography", Proc. SPIE 7823, Photomask Technology 2010, 78231C (29 September 2010); https://doi.org/10.1117/12.868485

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available