Using principal component analysis for photomask CD signature investigations

G. R. Cantrell; Christian Bürgel; Axel Feicke; Martin Sczyrba; Clemens Utzny

doi:10.1117/12.864139

24 September 2010 Using principal component analysis for photomask CD signature investigations

G. R. Cantrell, Christian Bürgel, Axel Feicke, Martin Sczyrba, Clemens Utzny

Proceedings Volume 7823, Photomask Technology 2010; 78232O (2010) https://doi.org/10.1117/12.864139
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

Reticle critical dimension (CD) errors must be minimized in order for photomask manufacturers to meet tight CD uniformity (CDU) requirements. Determining the source of reticle CD errors and reducing or eliminating their CDU contributions are some of the most relevant tasks facing process engineers. The AMTC has applied principal component analysis (PCA) to reticle resist CD measurements in order to examine variations in the data. PCA provided the major components of resist CD variation which were rescaled into reticle CD signatures. The dominant component of CD signature variation is very similar in shape and magnitude between two different chemically amplified resist (CAR) processes, most likely indicating the variation source is a common process or tool. CD variational signatures from PCA were used as a basis for launching investigations into potential reticle CD error sources. PCA was further applied to resist CD measurements from alternate process tools to assist efforts in judging the effectiveness of resist CD signature matching.

Citation Download Citation

G. R. Cantrell, Christian Bürgel, Axel Feicke, Martin Sczyrba, and Clemens Utzny "Using principal component analysis for photomask CD signature investigations", Proc. SPIE 7823, Photomask Technology 2010, 78232O (24 September 2010); https://doi.org/10.1117/12.864139

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