Polarization holograms for source-mask optimization

T. D. Milster; H. Noble; E. Ford; W. Dallas; R. A. Chipman; I. Matsubara; Y. Unno; S. McClain; P. Khulbe; W. S. T. Lam; D. Hansen

doi:10.1117/12.879534

5 April 2011 Polarization holograms for source-mask optimization

T. D. Milster, H. Noble, E. Ford, W. Dallas, R. A. Chipman, I. Matsubara, Y. Unno, S. McClain, P. Khulbe, W. S. T. Lam, D. Hansen

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Proceedings Volume 7973, Optical Microlithography XXIV; 79731A (2011) https://doi.org/10.1117/12.879534
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

A new technique is introduced to replace DOEs that are used for illumination in lithographic projectors with polarization computer generated holograms (PCGHs) that produce both arbitrary intensity and arbitrary polarization state in the illumination pupil. The additional capability of arbitrary polarization state adds an additional degree of freedom for source-mask optimization. The PCGHs are similar in design and construction to DOEs, but they incorporate polarizationsensitive elements. Three experiments are described that demonstrate different configurations of PCGHs deigned to produce a tangentially polarized ring. Measurements of ratio of polarization and polarization orientation indicate that all three configurations performed well. Experimetns are performed with visible (λ = 632.8nm) light.

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T. D. Milster, H. Noble, E. Ford, W. Dallas, R. A. Chipman, I. Matsubara, Y. Unno, S. McClain, P. Khulbe, W. S. T. Lam, and D. Hansen "Polarization holograms for source-mask optimization", Proc. SPIE 7973, Optical Microlithography XXIV, 79731A (5 April 2011); https://doi.org/10.1117/12.879534

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