This course provides attendees with a basic understanding of the physical principles that are relevant to solid immersion lenses (SILs), which are used to dramatically improve resolution in scanning laser microscopes. Both geometrical and wave-optics modeling are used to illustrate features of SILs. Since the SIL is used with one surface in proximity to the sample, the properties of the interface and light propagation into the sample are studied in detail. Contrast in the reflected-light signal is examined for a data storage application. The potential and state-of-the-art for SIL systems is reviewed.

A basic 'hands on' lecture is presented, in which students are given various optical components, including a source, lenses, gratings, etc., that are used to build a personal optical bench. Basic concepts of imaging, resolution, coherence factor, on-axis illumination, off-axis illumination, binary masks, phase-shift masks, etc., are examined by the students operating in small groups under the direction of the instructor. These concepts are related to real lithographic systems using basic principles and simulation. This course is intended to provide a foundation for the follow-on course, "Imaging and Optics Fundamentals in Microlithography" (SC706).

Topics to be discussed include an introduction to near-field recording, both solid immersion lens (SIL) and transducer based technology, and the theory of data readout and gap control. In addition, a number of real-world examples and demonstrations will be provided, including working examples of very high NA (1.4 – 2.0) lenses (design, manufacturing and testing), and a Near-Field set-up with an actuated SIL: light path, optical components and control signals, in particular for gap control. We will also cover topics on recording, such as gap signal normalization, chromatic aberration, first-surface and cover-layer protected media, and experimental results.

This course will introduce the design and packaging of present and future laser diode systems for applications in sensors, instrumentation and telecommunications. Topics will include (1) a review of laser diode optical properties; (2) collimation, focusing, circularization and astigmatism correction in laser diodes; (3) a topical overview of miniature optical components; and (4) an advanced design example.

A basic 'hands on' lecture is presented, in which students are given various optical components, including a source, lenses, gratings, etc., that are used to build a personal optical bench. Basic concepts of imaging, resolution, coherence factor, on-axis illumination, off-axis illumination, binary masks, phase-shift masks, etc., are examined by the students operating in small groups under the direction of the instructor. These concepts are related to real lithographic systems using basic principles and simulation. This course is intended to provide a foundation for the follow-on course, "Imaging and Optics Fundamentals in Microlithography" (SC706).

A basic 'hands on' lecture is presented, in which students are given various optical components, including sources, lenses, gratings, etc., that are used to build a personal optical bench. Basic concepts of interference, coherence, and diffraction are examined by the students operating in small groups under the direction of the instructor. These concepts are related to real optical systems and instruments.

A basic 'hands on' lecture is presented, in which students are given various optical components, including sources, lenses, gratings, etc., that are used to build a personal optical bench. Basic concepts of diffraction are examined by the students operating in small groups under the direction of the instructor. These concepts are related to real optical systems and instruments.

A basic 'hands on' lecture is presented, in which students are given various optical components, including a source, lenses, gratings, etc., that are used to build a personal optical bench. Basic concepts of imaging, resolution, coherence factor, on-axis illumination, off-axis illumination, binary masks, phase-shift masks, etc., are examined by the students operating in small groups under the direction of the instructor. These concepts are related to real lithographic systems using basic principles and simulation. This course is intended to provide a foundation for the follow-on course, "Imaging and Optics Fundamentals in Microlithography" (SC706).