Paper
23 May 2011 Physical marker based stitching process of circular and non-circular interferograms
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Abstract
The usage of stitching technologies in the interferometrical precision optics measurement technique becomes more and more popular. There exist already a few metrology stages providing the stitching principle, such as, for example, the well known Sub-Aperture Stitching Interferometer for Aspheres (SSI-A1) [1] [2] [3] from QED technologies. For measurements with the SSI-A the greatest measurable diameter of the test object is approximately 280 mm [1]. As a consequence the University of Applied Sciences Deggendorf develops an own measuring system in order to test large telescope mirrors with a diameter of more than one meter which should be ready for application in 2012. The expected positioning accuracy of the measuring patches is significantly lower in comparison with the high-accurate SSI-A. Therefore a cross-correlation based translation detection tool is implemented in our current software solution. Since the metrology system is currently being established the SSI-A and the μPhase2 interferometer from TRIOPTICS are used as input data sources for the software development. Further this paper discusses the robustness of the translation detection tool and presents a stabilisation method of the stitching result with the aid of physical markers.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Roland Maurer, Florian Schneider, Christian Vogt, Markus Schinhaerl, Peter Sperber, and Rolf Rascher "Physical marker based stitching process of circular and non-circular interferograms", Proc. SPIE 8083, Modeling Aspects in Optical Metrology III, 80830Q (23 May 2011); https://doi.org/10.1117/12.889491
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Cited by 2 scholarly publications.
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KEYWORDS
Metrology

Mirrors

Interferometers

Alignment procedures

Applied sciences

Computer generated holography

Optical testing

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