Controlling template erosion with advanced cleaning methods

SherJang Singh; Zhaoning Yu; Tobias Wähler; Nobuo Kurataka; Gene Gauzner; Hongying Wang; Henry Yang; Yautzong Hsu; Kim Lee; David Kuo; Peter Dress

doi:10.1117/12.916294

21 March 2012 Controlling template erosion with advanced cleaning methods

SherJang Singh, Zhaoning Yu, Tobias Wähler, Nobuo Kurataka, Gene Gauzner, Hongying Wang, Henry Yang, Yautzong Hsu, Kim Lee, David Kuo, Peter Dress

Author Affiliations +

Proceedings Volume 8323, Alternative Lithographic Technologies IV; 832317 (2012) https://doi.org/10.1117/12.916294
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

We studied the erosion and feature stability of fused silica patterns under different template cleaning conditions. The conventional SPM cleaning is compared with an advanced non-acid process. Spectroscopic ellipsometry optical critical dimension (SE-OCD) measurements were used to characterize the changes in pattern profile with good sensitivity. This study confirmed the erosion of the silica patterns in the traditional acid-based SPM cleaning mixture (H2SO4+H2O2) at a rate of ~0.1nm per cleaning cycle. The advanced non-acid clean process however only showed CD shift of ~0.01nm per clean. Contamination removal & pattern integrity of sensitive 20nm features under MegaSonic assisted cleaning is also demonstrated.

Citation Download Citation

SherJang Singh, Zhaoning Yu, Tobias Wähler, Nobuo Kurataka, Gene Gauzner, Hongying Wang, Henry Yang, Yautzong Hsu, Kim Lee, David Kuo, and Peter Dress "Controlling template erosion with advanced cleaning methods", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 832317 (21 March 2012); https://doi.org/10.1117/12.916294

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