25nm pitch master and replica mold fabrication for nanoimprinting lithography for 1Tbit/inch2 bit patterned media

Hideo Kobayashi; Shuji Kishimoto; Kouta Suzuki; Hiromasa Iyama; Sakae Nakatsuka; Kazutake Taniguchi; Takashi Sato; Tsuyoshi Watanabe

doi:10.1117/12.918664

21 March 2012 25nm pitch master and replica mold fabrication for nanoimprinting lithography for 1Tbit/inch² bit patterned media

Hideo Kobayashi, Shuji Kishimoto, Kouta Suzuki, Hiromasa Iyama, Sakae Nakatsuka, Kazutake Taniguchi, Takashi Sato, Tsuyoshi Watanabe

Author Affiliations +

Proceedings Volume 8323, Alternative Lithographic Technologies IV; 83231V (2012) https://doi.org/10.1117/12.918664
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Nanoimprint Lithography and a mold, mold replication from an EB master mold as well, those are essential for a large-scale production of bit patterned media. 1Tbit/inch² (bit pitch 25nm) areal density on a 2.5inch HDD media, it is feasibility demonstration target all the media makers and the HDD makers are aiming at. This paper describes difficulties we faced, and solutions we established by designing and optimizing materials and process, to fabricate 25nm pitch master mold by EBL as well as working replica mold by NIL.

Citation Download Citation

Hideo Kobayashi, Shuji Kishimoto, Kouta Suzuki, Hiromasa Iyama, Sakae Nakatsuka, Kazutake Taniguchi, Takashi Sato, and Tsuyoshi Watanabe "25nm pitch master and replica mold fabrication for nanoimprinting lithography for 1Tbit/inch² bit patterned media", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231V (21 March 2012); https://doi.org/10.1117/12.918664

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