The filter adsorption mechanism in photoresist materials

Tetsu Kohyama

doi:10.1117/12.916082

19 March 2012 The filter adsorption mechanism in photoresist materials

Tetsu Kohyama

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83252I (2012) https://doi.org/10.1117/12.916082
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Recently nylon filters have been widely implemented in photolithography processes to improve the yields because many IC and photoresist manufacturers have empirical evidence indicating that the nylon membrane can adsorb impurities. However, the mechanism by which the nylon membrane reduces defects is unclear. It is useful to study different defect-causing mechanisms by focusing on the particular components of photoresists. In this paper various adsorption tests were performed utilizing surface modification and different photoresist components to measure the effect of nylon membranes on resist properties, including surface tension, PAG (photoacid generator) concentration and quencher concentration. Ultimately, the study hopes to determine the most effective way to increase yields by focusing on how to best implement a nylon filtration strategy.

Citation Download Citation

Tetsu Kohyama "The filter adsorption mechanism in photoresist materials", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83252I (19 March 2012); https://doi.org/10.1117/12.916082

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