Fabrication Of Binary Optics Using Electron Beam Lithography

James Logue

doi:10.1117/12.944165

24 May 1988 Fabrication Of Binary Optics Using Electron Beam Lithography

James Logue

Proceedings Volume 0884, Computer-Generated Holography II; (1988) https://doi.org/10.1117/12.944165
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States

Abstract

Electron beam lithography is applicable to the fabrication of binary optics. Practical aspects of generating binary masks for zone plates and diffraction gratings using the Manu-facturing Electron Beam Exposure System (MEBES III) at Perkin-Elmer are discussed.

Citation Download Citation

James Logue "Fabrication Of Binary Optics Using Electron Beam Lithography", Proc. SPIE 0884, Computer-Generated Holography II, (24 May 1988); https://doi.org/10.1117/12.944165

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