Durability of Ru-based EUV masks and the improvement

Suyoung Lee; Jungyoup Kim; Soo-Wan Koh; Ilyong Jang; Jaehyuck Choi; Hyungho Ko; Hwan-Seok Seo; Seong-Sue Kim; Byung Gook Kim; Chan-Uk Jeon

doi:10.1117/12.2046556

17 April 2014 Durability of Ru-based EUV masks and the improvement

Suyoung Lee, Jungyoup Kim, Soo-Wan Koh, Ilyong Jang, Jaehyuck Choi, Hyungho Ko, Hwan-Seok Seo, Seong-Sue Kim, Byung Gook Kim, Chan-Uk Jeon

Author Affiliations +

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90480J (2014) https://doi.org/10.1117/12.2046556
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

In EUV Lithography, an absence of promising candidate of EUV pellicle demands new requirements of EUV mask cleaning which satisfy the cleaning durability and removal efficiency of the various contaminations from accumulated EUV exposure. It is known that the cleaning with UV radiation is effective method of variety of contaminants from surface, while it reduces durability of Ru capping layer. To meet the expectation of EUV mask lifetime, it is essential to understand the mechanism of Ru damage. In this paper, we investigate dominant source of Ru damage using cleaning method with UV radiation. Based on the mechanism, we investigate several candidates of capping to increase the tolerance from the cycled UV cleaning. In addition, we study durability difference depending on the deposition method of Ru capping. From these studies, it enables to suggest proper capping material, stack and cleaning process.

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Suyoung Lee, Jungyoup Kim, Soo-Wan Koh, Ilyong Jang, Jaehyuck Choi, Hyungho Ko, Hwan-Seok Seo, Seong-Sue Kim, Byung Gook Kim, and Chan-Uk Jeon "Durability of Ru-based EUV masks and the improvement", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90480J (17 April 2014); https://doi.org/10.1117/12.2046556

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