Illumination system without scanning slit for lithographic tools

Yunbo Zhang; Aijun Zeng; Ying Wang; Mingxing Chen; Shanhua Zhang; Qiao Yuan; Huijie Huang

doi:10.1117/12.2046303

31 March 2014 Illumination system without scanning slit for lithographic tools

Yunbo Zhang, Aijun Zeng, Ying Wang, Mingxing Chen, Shanhua Zhang, Qiao Yuan, Huijie Huang

Proceedings Volume 9052, Optical Microlithography XXVII; 90522H (2014) https://doi.org/10.1117/12.2046303
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

The step-and-scan lithographic illumination system has a scanning slit which could not only control the exposure field size but also assist the wafer to complete scanning process with high uniformity. The scanning slit is comprised by four blades which are drive by four electric actuators. This paper presents a 193nm lithographic illumination system without utilizing scanning slit. A microlens array, a micromirror array and a collimating lens are used to generated a certain intensity distribution on the surface of the aperture array. A fast scanning mirror is used in to change the position of the formed intensity distribution to change the illuniated area on the mask. That can realize lithographic scanning process without slit.

Citation Download Citation

Yunbo Zhang, Aijun Zeng, Ying Wang, Mingxing Chen, Shanhua Zhang, Qiao Yuan, and Huijie Huang "Illumination system without scanning slit for lithographic tools", Proc. SPIE 9052, Optical Microlithography XXVII, 90522H (31 March 2014); https://doi.org/10.1117/12.2046303

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