Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography

Yue Jia; Yanqiu Li; Lihui Liu; Chunying Han; Xiaolin Liu

doi:10.1117/12.2087529

13 November 2014 Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography

Yue Jia, Yanqiu Li, Lihui Liu, Chunying Han, Xiaolin Liu

Author Affiliations +

Proceedings Volume 9277, Nanophotonics and Micro/Nano Optics II; 92770Z (2014) https://doi.org/10.1117/12.2087529
Event: SPIE/COS Photonics Asia, 2014, Beijing, China

Abstract

As the numerical aperture (NA) increasing and process factor k₁ decreasing in 193nm immersion lithography, polarization aberration (PA) of projection optics leads to image quality degradation seriously. Therefore, this work proposes a new scheme for compensating polarization aberration. By simulating we found that adjusting the illumination source partial coherent factors σ_out is an effective method for decreasing the PA induced pattern critical dimension (CD) error while keeping placement error (PE) within an acceptable range. Our simulation results reveal that the proposed method can effectively compensate large PA in actual optics.

Citation Download Citation

Yue Jia, Yanqiu Li, Lihui Liu, Chunying Han, and Xiaolin Liu "Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography", Proc. SPIE 9277, Nanophotonics and Micro/Nano Optics II, 92770Z (13 November 2014); https://doi.org/10.1117/12.2087529

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