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Yue Jia
at Beijing Institute of Technology
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 13 November 2014 Paper
Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography
Proceedings Volume 9277, 92770Z (2014) https://doi.org/10.1117/12.2087529
KEYWORDS: Polarization, 3D acquisition, Immersion lithography, Critical dimension metrology, Cadmium, Lithographic illumination, Lithography, Error analysis, Projection systems, Image processing
Proceedings Article | 21 August 2014 Paper
A method for compensating the polarization aberration of projection optics in immersion lithography
Proceedings Volume 9283, 928309 (2014) https://doi.org/10.1117/12.2069711
KEYWORDS: Cadmium, Crystals, Polarization, Lithography, Protactinium, Projection systems, Birefringence, Immersion lithography, Critical dimension metrology, Lithographic illumination
Conference Committee Involvement (1)
Photonics Asia
9 October 2014 |
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