In this paper, we present the insight for the wafer-based overlay correction with optimal measurement resource which is suitable for mass production. The experiment which is the wafer-based overlay correction by several statistical analyses carried out for 2X nm node DRAM. Among them, linear regression is a strong candidate for wafer-based overlay control, which improved up to 0.8 nm of maximum overlay. |
ACCESS THE FULL ARTICLE
No SPIE Account? Create one
CITATIONS
Cited by 2 scholarly publications.
Semiconducting wafers
Logic
Reticles
Overlay metrology
Control systems
Statistical analysis
Process control