New grade of 9-inch size mask blanks for 450mm wafer process (2015)

Noriyuki Harashima; Hiroyuki Iso; Tatsuya Chishima

doi:10.1117/12.2196958

11 November 2015 New grade of 9-inch size mask blanks for 450mm wafer process (2015)

Noriyuki Harashima, Hiroyuki Iso, Tatsuya Chishima

Proceedings Volume 9635, Photomask Technology 2015; 96351L (2015) https://doi.org/10.1117/12.2196958
Event: SPIE Photomask Technology, 2015, Monterey, California, United States

Abstract

6-inch size (known as 6025QZ) binary Cr mask is widely used in the semiconductor lithography for over 20years. Recently for the 450mm wafer process, high grade 9-inch size mask is expected. For this application, we have studied and developed new grade 9-inch size mask blanks for recent 450mm wafer process requirement. There are three types of glass substrates material use and select as 9inch size mask blanks and for required applications by the users. Each glass material has advantage and disadvantage for lithography process as well as wafer process. By knowing the each glass substrate material characteristics and quality level the users enable to select the proper 9inch mask blanks for their targeting applications. At present, ULCOAT has produced 9-inch size mask blanks by the most advanced chrome sputtering equipment use for 6025QZ.

Citation Download Citation

Noriyuki Harashima, Hiroyuki Iso, and Tatsuya Chishima "New grade of 9-inch size mask blanks for 450mm wafer process (2015)", Proc. SPIE 9635, Photomask Technology 2015, 96351L (11 November 2015); https://doi.org/10.1117/12.2196958

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