Paper
8 October 2015 Modeling Fizeau interferometer based on ray tracing with Zemax
Author Affiliations +
Proceedings Volume 9677, AOPC 2015: Optical Test, Measurement, and Equipment; 96770G (2015) https://doi.org/10.1117/12.2197612
Event: Applied Optics and Photonics China (AOPC2015), 2015, Beijing, China
Abstract
A convenient method to study the influence of error sources in Fizeau is to build a ray-tracing model to simulate the error sources. In this paper an interferometer model is presented; an extension program is called to simulate the interference; and a preliminary research of several error sources is conducted. These examples demonstrate error analysis based on interferometer models is feasible and provide some guidance for optimizing our interferometer design.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yiwei He, Xi Hou, Yongqian Wu, Fan Wu, Haiyang Quan, and Fengwei Liu "Modeling Fizeau interferometer based on ray tracing with Zemax", Proc. SPIE 9677, AOPC 2015: Optical Test, Measurement, and Equipment, 96770G (8 October 2015); https://doi.org/10.1117/12.2197612
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KEYWORDS
Interferometers

Error analysis

Photovoltaics

Zemax

Imaging systems

Fizeau interferometers

Sensors

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