High-efficiency bispectral laser source for EUV lithography

A. P. Zhevlakov; R. P. Seisyan; V. G. Bespalov; V. V. Elizarov; A. S. Grishkanich; S. V. Kascheev

doi:10.1117/12.2214732

14 March 2016 High-efficiency bispectral laser source for EUV lithography

A. P. Zhevlakov, R. P. Seisyan, V. G. Bespalov, V. V. Elizarov, A. S. Grishkanich, S. V. Kascheev

Proceedings Volume 9735, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXI; 97351F (2016) https://doi.org/10.1117/12.2214732
Event: SPIE LASE, 2016, San Francisco, California, United States

Abstract

New concept of EUV radiation power scaling in the intermediate focus of the illumination system is proposed. The multiplex source scheme based on combination of several sources with acceptable level power allows to concentrate EUV light on the total power level of 1kW and more have been developed. The experimental results showed that the power consumption in the double-pulse bi-spectral primary source for EUV lithography can be substantially decrease by replacing pre-amplifiers in power CO₂ laser on the SRS converters wavelength 1.06 μm to 10.6 μm while maintaining efficiency of EUV radiation output of illuminated plasma.

Citation Download Citation

A. P. Zhevlakov, R. P. Seisyan, V. G. Bespalov, V. V. Elizarov, A. S. Grishkanich, and S. V. Kascheev "High-efficiency bispectral laser source for EUV lithography", Proc. SPIE 9735, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXI, 97351F (14 March 2016); https://doi.org/10.1117/12.2214732

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