First generation laser-produced plasma source system for HVM EUV lithography

Hakaru Mizoguchi; Tamotsu Abe; Yukio Watanabe; Takanobu Ishihara; Takeshi Ohta; Tsukasa Hori; Akihiko Kurosu; Hiroshi Komori; Kouji Kakizaki; Akira Sumitani; Osamu Wakabayashi; Hiroaki Nakarai; Junichi Fujimoto; Akira Endo

doi:10.1117/12.846271

19 March 2010 First generation laser-produced plasma source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Akihiko Kurosu, Hiroshi Komori, Kouji Kakizaki, Akira Sumitani, Osamu Wakabayashi, Hiroaki Nakarai, Junichi Fujimoto, Akira Endo

Author Affiliations +

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 763608 (2010) https://doi.org/10.1117/12.846271
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

The 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography is under development. We report latest status of the device which consists of the original concepts (1) CO₂ laser driven Sn plasma, (2) Hybrid CO₂ laser system that is combination of high speed (>100kHz) short pulse oscillator and industrial cw-CO₂, (3) Magnetic mitigation, and (4) Double pulse EUV plasma creation. Maximum burst on time power is 69W (100kHz, 0.7 mJ EUV power @ intermediate focus), laser-EUV conversion efficiency is 2.3%, duty cycle is 20% at maximum. Continuous operation time is so far up to 3 hours. Debris is efficiently suppressed by pre-pulse plasma formation and magnetic field mitigation system. Long-term performance is now under investigation. Also future plan is updated.

Citation Download Citation

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Akihiko Kurosu, Hiroshi Komori, Kouji Kakizaki, Akira Sumitani, Osamu Wakabayashi, Hiroaki Nakarai, Junichi Fujimoto, and Akira Endo "First generation laser-produced plasma source system for HVM EUV lithography", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763608 (19 March 2010); https://doi.org/10.1117/12.846271

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