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11 November 2022 Actinic EUV reflectometry and scatterometry: from national lab to commercial applications
Stuart Sherwin
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Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC122920P (2022) https://doi.org/10.1117/12.2643550
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States
Abstract
With EUV attenuated phase shift absorbers rapidly approaching maturity, actinic metrology previously developed at scientific facilities must be transferred to high volume manufacturing. We explore the performance of actinic phase metrology with reflectometry and scatterometry, using either a synchrotron light source at a scientific facility, or a plasma light source in a commercial tool. We assess the impact of challenges from temporal and spatial coherence, throughput, and measurement noise. We present simulations and experiments to compare the performance of the Center for X-Ray Optics reflectometry and scattering beamline with the EUV Tech ENK reflectometry and scattering tool.
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Stuart Sherwin "Actinic EUV reflectometry and scatterometry: from national lab to commercial applications", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC122920P (11 November 2022); https://doi.org/10.1117/12.2643550
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KEYWORDS
Reflectometry
Extreme ultraviolet
Scatterometry
Laser scattering
Light scattering
Light sources
Metrology
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