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2 October 2024 Microscopic characterization of complex permittivity and film thickness using imaging spectroscopic ellipsometry
Hanaul Noh
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Proceedings Volume PC13130, Novel Optical Systems, Methods, and Applications XXVII; PC1313007 (2024) https://doi.org/10.1117/12.3027739
Event: Optical Engineering + Applications, 2024, San Diego, California, United States
Abstract
Ellipsometry is a well-known, non-destructive optical method to measure a thin film's thickness and optical properties. It has been widely used to characterize the complex permittivity of a material or to control the quality of a film's thickness in manufacturing processes. Demands on microscopic characterizations of optical properties have been greatly increased for new materials and structures such as 2D materials, photonic devices, to name a few. Conventional ellipsometry, however, has been restricted to a spatial resolution of several tens of microns due to the spot size limitation. Here, we introduce imaging spectroscopic ellipsometry (ISE), which enables 1-micron lateral resolution, and its application to novel materials and structures. The ISE technique can be extensively used for new materials research and quality control of industrial applications.
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Hanaul Noh "Microscopic characterization of complex permittivity and film thickness using imaging spectroscopic ellipsometry", Proc. SPIE PC13130, Novel Optical Systems, Methods, and Applications XXVII, PC1313007 (2 October 2024); https://doi.org/10.1117/12.3027739
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KEYWORDS
Film thickness
Imaging spectroscopy
Spectroscopic ellipsometry
Optical properties
2D materials
Ellipsometry
Infrared cameras
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