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Home > eBooks > Photon Sources for Lithography and Metrology > High-Brightness Laser-Assisted Discharge-Produced Plasma EUV Source for Mask Inspection and Exposure Applications
High-Brightness Laser-Assisted Discharge-Produced Plasma EUV Source for Mask Inspection and Exposure Applications
Book: Photon Sources for Lithography and Metrology
Editor(s): Vivek Bakshi
Author(s): Yusuke Teramoto
Published: 2023
https://doi.org/10.1117/3.2638242.ch9
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Abstract
This chapter covers the system configuration of the LDP source, its features and performances, the dynamics of EUV-emitting plasma, the source stability and cleanliness, and a LDP source comparison with the other source technologies.
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CHAPTER 9
 31 PAGES
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KEYWORDS
Plasma
Extreme ultraviolet
Tin
Electrodes
Inspection
Extreme ultraviolet lithography
Head
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