Journal of Micro/Nanolithography, MEMS, and MOEMS

Editor-in-Chief: Chris A. Mack,, USA

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.

Journal of Micro/Nanolithography, MEMS, and MOEMS

Special Section on Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects

Guest Editors: John Robinson, Tim Brunner, and Gian Lorusso

Special Section on Novel Patterning Technologies

Guest Editors: Eric Panning and Martha Sanchez

Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes

Dhairya Dixit et al.

August 2018


from the Journal of Micro/Nanolithography, MEMS, and MOEMS

Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching

Joshua M. Duran, Andrew Sarangan (2017) Open Access

High-density electrical and optical probes for neural readout and light focusing in deep brain tissue

Vittorino Lanzio et al. (2018) Open Access

Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists

Ruben Maas, M.-Claire van Lare, Gijsbert Rispens, Sander F. Wuister (2018) Open Access

Low-power, low-pressure reactive-ion etching process for silicon etching with vertical and smooth walls for mechanobiology application

Mohammed Ashraf, Sree V. Sundararajan, Gianluca Grenci (2017) Open Access

Control of optical nanometer gap shapes made via standard lithography using atomic layer deposition

Jiyeah Rhie et al. (2018) Open Access

Shot noise: a 100-year history, with applications to lithography

Chris A. Mack (2018)

Surface feature engineering through nanosphere lithography

Tod V. Laurvick, Ronald A. Coutu, Jr., James M. Sattler, Robert A. Lake (2016) Open Access

Current understanding of the electrostatic risk to reticles used in microelectronics and similar manufacturing processes

Gavin C. Rider (2018) Open Access

Fabrication and analysis of metallic nanoslit structures: advancements in the nanomasking method

Stephen J. Bauman, Ahmad A. Darweesh, Desalegn T. Debu, Joseph B. Herzog (2018) Open Access

Effective–CD: a contribution toward the consideration of line edge roughness in the scatterometric critical dimension metrology

Bartosz Bilski, Karsten Frenner, Wolfgang Osten (2017) Open Access

Video introduction to the journal

Author benefits:

  • Rigorous and prompt peer review (median time from submission to first decision: 36 days)
  • Rapid, e-first publication of articles (median time from acceptance to online publication, including copyediting and typesetting: 24 days)
  • Professional copyediting and typesetting
  • Free online color figures
  • Free inclusion of videos and multimedia 
  • Open access publication option at a low cost
  • 5 free downloads from the SPIE Digital Library for authors
  • Integration with Code Ocean, a cloud-based code development and publishing platform


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