Resolution enhancement of 157 nm lithography by liquid immersion

Michael Switkes; Mordechai Rothschild

doi:10.1117/1.1502260

1 October 2002 Resolution enhancement of 157 nm lithography by liquid immersion

Michael Switkes, Mordechai Rothschild

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 1, Issue 3, (October 2002). https://doi.org/10.1117/1.1502260

Abstract

We present the results of a preliminary feasibility study of liquid immersion lithography at 157 nm. A key enabler has been the identification of a class of commercially available liquids, perfluoropolyethers, with low 157 nm absorbance α₁₅₇≈10 cm^–1 base 10. With 157 nm index of refraction around 1.36, these liquids could enable lithography at numerical aperture ≈1.25 and thus resolution of 50 nm for k₁ = 0.4. We have also performed preliminary studies on the optical, chemical, and physical suitability of these liquids for use in high throughput lithography. We also note that at longer wavelengths, there is a wider selection of transparent immersion liquids. At 193 nm, the most transparent liquid measured, de-ionized water, has α₁₉₃ = 0.036 cm^–1 base 10. Water immersion lithography at 193 nm would enable resolution of 60 nm with k₁ = 0.4.

©(2002) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Michael Switkes and Mordechai Rothschild "Resolution enhancement of 157 nm lithography by liquid immersion," Journal of Micro/Nanolithography, MEMS, and MOEMS 1(3), (1 October 2002). https://doi.org/10.1117/1.1502260

Published: 1 October 2002

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