23 December 2017 Tapered microelectrode array system for dielectrophoretically filtration: fabrication, characterization, and simulation study
Muhamad R. Buyong, Farhad Larki, Yuzuru Takamura, Burhanuddin Yeop Majlis
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Abstract
This paper presents the fabrication, characterization, and simulation of microelectrode arrays system with tapered profile having an aluminum surface for dielectrophoresis (DEP)-based manipulation of particles. The proposed structure demonstrates more effective electric field gradient compared with its counterpart with untapered profile. Therefore, according to the asymmetric distribution of the electric field in the active region of microelectrode, it produces more effective particle manipulation. The tapered aluminum microelectrode array (TAMA) fabrication process uses a state-of-the-art technique in the formation of the resist’s taper profile. The performance of TAMA with various sidewall profile angles (5 deg to 90 deg) was analyzed through finite-element method numerical simulations to offer a better understanding of the origin of the sidewall profile effect. The ability of capturing and manipulating of the device was examined through modification of the Clausius–Mossotti factor and cross-over frequency (fx0). The fabricated system has been particularly implemented for filtration of particles with a desired diameter from a mixture of particles with three different diameters in an aqueous medium. The microelectrode system with tapered side wall profile offers a more efficient platform for particle manipulation and sensing applications compared with the conventional microelectrode systems.
© 2017 Society of Photo-Optical Instrumentation Engineers (SPIE) 1932-5150/2017/$25.00 © 2017 SPIE
Muhamad R. Buyong, Farhad Larki, Yuzuru Takamura, and Burhanuddin Yeop Majlis "Tapered microelectrode array system for dielectrophoretically filtration: fabrication, characterization, and simulation study," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(4), 044501 (23 December 2017). https://doi.org/10.1117/1.JMM.16.4.044501
Received: 23 May 2017; Accepted: 15 November 2017; Published: 23 December 2017
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Cited by 15 scholarly publications.
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KEYWORDS
Particles

Dielectrophoresis

Etching

Aluminum

Finite element methods

Electronic filtering

Device simulation

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