Fabrication of monomode channel waveguides in photosensitive polymer on optical adhesive

Rahul Singhal; M. N. Satyanarayan; Suchandan Pal

doi:10.1117/1.3622758

1 September 2011 Fabrication of monomode channel waveguides in photosensitive polymer on optical adhesive

Rahul Singhal, M. N. Satyanarayan, Suchandan Pal

Author Affiliations +

Optical Engineering, Vol. 50, Issue 9, 094601 (September 2011). https://doi.org/10.1117/1.3622758

Abstract

We present fabrication of optical waveguides in a photosensitive polymer. The process to fabricate monomode polymeric channel waveguides using simple direct ultraviolet (UV) photolithography is optimized. Channel waveguides of width ~2 to 2.4 µm and height ~1.8 to 2.2 µm are obtained on development after a crosslinkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Norland Optical Adhesive 61 (NOA 61) was used as under- and overclad. The average insertion loss obtained at chip-level is ~11 dB (TE₀₀) and ~12 dB (TM₀₀) for 2-cm waveguide at 1550 nm.

©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Rahul Singhal, M. N. Satyanarayan, and Suchandan Pal "Fabrication of monomode channel waveguides in photosensitive polymer on optical adhesive," Optical Engineering 50(9), 094601 (1 September 2011). https://doi.org/10.1117/1.3622758

Published: 1 September 2011

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