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25 June 2014 Near-ultraviolet absorption annealing in hafnium oxide thin films subjected to continuous-wave laser radiation
Semyon Papernov, Alexei A. Kozlov, James B. Oliver, Terrance J. Kessler, Alexander Shvydky, Brendan T. Marozas
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Optical Engineering, Vol. 53, Issue 12, 122504 (June 2014). https://doi.org/10.1117/1.OE.53.12.122504
Abstract
Hafnium oxide (HfO 2 ) is the most frequently used high-index material in multilayer thin-film coatings for high-power laser applications ranging from near-infrared to near-ultraviolet (UV). Absorption in this high-index material is also known to be responsible for nanosecond-pulse laser-damage initiation in multilayers. In this work, modification of the near-UV absorption of HfO 2 monolayer films subjected to irradiation by continuous-wave (cw), 355-nm or 351-nm laser light focused to produce power densities of the order of ∼100  kW/cm 2 is studied. Up to a 70% reduction in absorption is found in the areas subjected to irradiation. Temporal behavior of absorption is characterized by a rapid initial drop on the few-tens-of-seconds time scale, followed by a longer-term decline to a steady-state level. Absorption maps generated by photothermal heterodyne imaging confirm the permanent character of the observed effect. Nanosecond-pulse, 351-nm and 600-fs, 1053-nm laser-damage tests performed on these cw laser–irradiated areas confirm a reduction of absorption by measuring up to 25% higher damage thresholds. We discuss possible mechanisms responsible for near-UV absorption annealing and damage-threshold improvement resulting from irradiation by near-UV cw laser light.
CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
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Semyon Papernov, Alexei A. Kozlov, James B. Oliver, Terrance J. Kessler, Alexander Shvydky, and Brendan T. Marozas "Near-ultraviolet absorption annealing in hafnium oxide thin films subjected to continuous-wave laser radiation," Optical Engineering 53(12), 122504 (25 June 2014). https://doi.org/10.1117/1.OE.53.12.122504
Published: 25 June 2014
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Cited by 16 scholarly publications.
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KEYWORDS
Absorption
Continuous wave operation
Hybrid fiber optics
Annealing
Near ultraviolet
Thin films
Pulsed laser operation
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