7 January 2022 Elimination of overexposed area and its phase correction method in speckle pattern interferometry
Yonghong Wang, Shuangle Wu, Yanfeng Yao, Chen Li, Peizheng Yan
Author Affiliations +
Abstract

In the practical application of speckle pattern interferometry, it is often necessary to measure the deformation or defect of some specimens placed in boxes. Transparent glass observation windows are often used on one side of these boxes. In laser speckle pattern interferometry, the glass windows often cause local overexposure in the field of view, which has a great influence on the measurement. A method for identification and elimination of overexposed areas based on polarized optics is proposed. A polarization camera is used for image acquisition; polaroid is used to filter out stray and chaotic interference light, greatly reducing the overexposed area in the imaging field of view, and then feature extraction technology is used to identify and extract the overexposed area caused by the glass window. Finally, according to the measurement information around the overexposed area, the phase of the overexposed area is fitted and corrected, so as to obtain the speckle pattern interferometry measurement results without overexposed points. Experimental results show that the proposed method can effectively extract and eliminate the overexposed area, and good measurement results can be obtained.

© 2022 Society of Photo-Optical Instrumentation Engineers (SPIE) 0091-3286/2022/$28.00 © 2022 SPIE
Yonghong Wang, Shuangle Wu, Yanfeng Yao, Chen Li, and Peizheng Yan "Elimination of overexposed area and its phase correction method in speckle pattern interferometry," Optical Engineering 61(6), 061402 (7 January 2022). https://doi.org/10.1117/1.OE.61.6.061402
Received: 8 October 2021; Accepted: 22 November 2021; Published: 7 January 2022
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KEYWORDS
Glasses

Interferometry

Speckle pattern

Polarization

Optical filters

Polarizers

Cameras

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