Sub-picosecond 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxide thin films (Erratum)

18 May 2022 Sub-picosecond 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxide thin films (Erratum)

Marek Stehlik, Goby Govindassamy, Janis Zideluns, Fabien Le Marchand, Frank Wagner, Julien Lumeau, Jacob Mackenzie, Laurent Gallais

Abstract

Erratum corrects the paper’s citation identification number.

This article was originally published on 23 April 2022, with an incorrect citation identification (CID) number of 070903. It has been republished with a correct CID of 071603. The full correct citation is Optical Engineering, 61(7), 071603 (2022). https://doi.org/10.1117/1.OE.61.7.071603. The paper was corrected on 6 May 2022.

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Marek Stehlik, Goby Govindassamy, Janis Zideluns, Fabien Le Marchand, Frank Wagner, Julien Lumeau, Jacob Mackenzie, and Laurent Gallais "Sub-picosecond 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxide thin films (Erratum)," Optical Engineering 61(7), 079801 (18 May 2022). https://doi.org/10.1117/1.OE.61.7.079801

Published: 18 May 2022

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KEYWORDS

Laser damage threshold

Laser induced damage

Thin film deposition

Thin films

Optical engineering

Optoelectronics

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