Dr. Ali A. Afzali-Ardakani
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 25 March 2016 Paper
Proceedings Volume 9779, 97790A (2016) https://doi.org/10.1117/12.2218457
KEYWORDS: Extreme ultraviolet, Photons, Quantum efficiency, Absorption, Extreme ultraviolet lithography, Semiconductor manufacturing, Chemically amplified resists, Image quality, Iodine, Hydrogen, Photoresist materials, Contamination, Deep ultraviolet

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