Dr. Anatol M. Schwersenz Profile

Dr. Anatol M. Schwersenz

Product Manager at Institut für Mikroelektronik Stuttgart

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Publications (6)

Proceedings Article | 29 March 2006 Paper

Evaluation of most recent chemically amplified resists for high resolution direct write using a Leica SB350 variable shaped beam writer

Anatol Schwersenz, Dirk Beyer, Monika Boettcher, Kang-Hoon Choi, Ulrich Denker, Christoph Hohle, Mathias Irmscher, Frank-Michael Kamm, Karl-Heinz Kliem, Johannes Kretz, Holger Sailer, Frank Thrum

Proceedings Volume 6153, 615347 (2006) https://doi.org/10.1117/12.655497

KEYWORDS: Semiconducting wafers, Photomasks, Optical lithography, Chemically amplified resists, Photoresist processing, Electron beam lithography, Beam shaping, Prototyping, Coating, Lithography

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Proceedings Article | 23 March 2006 Paper

NIL template manufacturing using a variable shaped e-beam writer and a new pCAR

Mathias Irmscher, Joerg Butschke, Guenter Hess, Corinna Koepernik, Florian Letzkus, Markus Renno, Holger Sailer, Hubert Schulz, Anatol Schwersenz, Ecron Thompson

Proceedings Volume 6151, 615115 (2006) https://doi.org/10.1117/12.656108

KEYWORDS: Etching, Quartz, Nanoimprint lithography, Photoresist processing, Photomasks, Chromium, Manufacturing, Electron beam lithography, Chemically amplified resists, Beam shaping

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Proceedings Article | 8 November 2005 Paper

Template manufacturing for nanoimprint lithography using existing infrastructure

Mathias Irmscher, Joerg Butschke, Guenter Hess, Florian Letzkus, Markus Renno, Holger Sailer, Hubert Schulz, Anatol Schwersenz, Ecron Thompson, Boris Vratzov

Proceedings Volume 5992, 59922E (2005) https://doi.org/10.1117/12.629974

KEYWORDS: Etching, Quartz, Manufacturing, Nanoimprint lithography, Photomasks, Photoresist processing, Electron beam lithography, Chromium, Chemically amplified resists, Printing

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Proceedings Article | 28 June 2005 Paper

Evaluation of e-beam sensitive CARs for advanced mask making

Axel Feicke, Mathias Irmscher, Anatol Schwersenz, Martin Tschinkl

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617111

KEYWORDS: Line edge roughness, Photoresist processing, Etching, Photomasks, Mask making, Scanning electron microscopy, Thin film coatings, Semiconducting wafers, Diffusion, Coating

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Proceedings Article | 6 December 2004 Paper

Patterning performance of most recent e-beam-sensitive CARs for advanced mask making: an update

Anatol Schwersenz, Joerg Butschke, Axel Feicke, Mathias Irmscher, Peter Voehringer

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568819

KEYWORDS: Line edge roughness, Etching, Mask making, Electron beam lithography, Critical dimension metrology, Coating, Photoresist processing, Chemically amplified resists, Scanning electron microscopy, Temperature metrology

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Proceedings Article | 28 August 2003 Paper

Comparison of new film nozzle with standard nozzle for aqueous puddle developing of photomasks

Christian Buergel, Werner Saule, M. Strobl, Peter Dress, Anatol Schwersenz, Martin Tschinkl

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504190

KEYWORDS: Photomasks, Standards development, Inspection, Image processing, Photoresist processing, Critical dimension metrology, Chemically amplified resists, Scanning electron microscopy, 3D image processing, Silver

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Showing 5 of 6 publications

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