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Boren Luo
at Taiwan Semiconductor Manufacturing Co Ltd
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Publications (1)
Proceedings Article | 7 March 2008 Paper
Pellicle effect on OPC modeling
Boren Luo, Chi-Kang Chang, W. Wang, W. Huang, Timothy Wu, C. Lai, R. Liu, H. Lin, K. Chen, Y. Ku
Proceedings Volume 6924, 69243T (2008) https://doi.org/10.1117/12.775419
KEYWORDS: Pellicles, Optical proximity correction, Photomasks, Data modeling, Polarization, Immersion lithography, Projection systems, Diffraction, Signal attenuation, Critical dimension metrology
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