Ms. Cansu Hanim Canpolat Schmidt Profile

Cansu Hanim Canpolat Schmidt

at Fraunhofer ENAS

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Publications (1)

Proceedings Article | 1 November 2022 Paper

Lithographic performance of resist ma-N 1402 in an e-beam/i-line stepper intra-level mix and match approach

C. Canpolat-Schmidt, G. Heldt, C. Helke, A. Voigt, D. Reuter

Proceedings Volume 12472, 124720J (2022) https://doi.org/10.1117/12.2639447

KEYWORDS: Electron beam lithography, Lithography, Photoresist processing, Scanning electron microscopy, Bottom antireflective coatings, Beam shaping, Silicon

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