Mr. Chaoxing Yang Profile

Chaoxing Yang

at Shanghai Institute of Optics and Fine Mechanics

SPIE Involvement:

Author

Publications (7)

SPIE Journal Paper | 27 February 2019 Open Access

Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy (Erratum)

Heng Zhang, Sikun Li, Xiangzhao Wang, Chaoxing Yang, Wei Cheng

JM3, Vol. 18, Issue 01, 019801, (February 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.019801

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithium, EUV optics, Mechanics

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SPIE Journal Paper | 3 December 2018

Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy

Heng Zhang, Sikun Li, Xiangzhao Wang, Chaoxing Yang, Wei Cheng

JM3, Vol. 17, Issue 04, 043505, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.043505

KEYWORDS: Photomasks, Optimization (mathematics), Extreme ultraviolet lithography, Computer programming, Computer simulations, Evolutionary algorithms, Lithography, Manufacturing, Lithium, High volume manufacturing

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Proceedings Article | 15 March 2016 Paper

Pixel-based mask optimization via particle swarm optimization algorithm for inverse lithography

Lei Wang, Sikun Li, Xiangzhao Wang, Chaoxing Yang, Feng Tang

Proceedings Volume 9780, 97801V (2016) https://doi.org/10.1117/12.2230404

KEYWORDS: Source mask optimization, Particle swarm optimization, Lithography, Optical lithography, Resolution enhancement technologies, Photomasks, Particles, Molybdenum, Algorithm development, Manufacturing

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SPIE Journal Paper | 19 February 2016

Pixelated source optimization for optical lithography via particle swarm optimization

Lei Wang, Sikun Li, Xiangzhao Wang, Guanyong Yan, Chaoxing Yang

JM3, Vol. 15, Issue 01, 013506, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.1.013506

KEYWORDS: Particle swarm optimization, Particles, Photomasks, Optical lithography, Lithographic illumination, Lithography, Optimization (mathematics), Source mask optimization, Image quality, Resolution enhancement technologies

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Proceedings Article | 18 March 2015 Paper

Source optimization using particle swarm optimization algorithm in photolithography

Lei Wang, Sikun Li, Xiangzhao Wang, Guanyong Yan, Chaoxing Yang

Proceedings Volume 9426, 94261L (2015) https://doi.org/10.1117/12.2181335

KEYWORDS: Particle swarm optimization, Particles, Optimization (mathematics), Optical lithography, Source mask optimization, Photomasks, Genetic algorithms, Resolution enhancement technologies, Lithography, Image quality

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SPIE Journal Paper | 2 October 2014

Efficient source mask optimization using multipole source representation

Chaoxing Yang, Sikun Li, Xiangzhao Wang

JM3, Vol. 13, Issue 04, 043001, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043001

KEYWORDS: Source mask optimization, Computer simulations, Lithium, Lithography, Lithographic illumination, Genetic algorithms, Logic, Optimization (mathematics), Zernike polynomials, Airborne remote sensing

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Proceedings Article | 12 April 2013 Paper

Source mask optimization using real-coded genetic algorithms

Chaoxing Yang, Xiangzhao Wang, Sikun Li, Andreas Erdmann

Proceedings Volume 8683, 86831T (2013) https://doi.org/10.1117/12.2010137

KEYWORDS: Source mask optimization, Photomasks, Genetic algorithms, Binary data, Logic, Lithographic illumination, Genetics, Optimization (mathematics), Computer programming, Inverse problems

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Showing 5 of 7 publications

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