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Daniel Sullivan
Principal Engineer at Seagate Technology LLC
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 28 March 2014 Paper
Hard disk drive thin film head manufactured using nanoimprint lithography
Daniel Sullivan, Thomas Boonstra, Mark Kief, Lily Youtt, Sethuraman Jayashankar, Carolyn Van Dorn, Harold Gentile, Sriram Viswanathan, Dexin Wang, Dion Song, Dongsung Hong, Sung-Hoon Gee
Proceedings Volume 9049, 90490Z (2014) https://doi.org/10.1117/12.2048829
KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Head, Thin films, Lithography, Optical lithography, Etching, Wafer-level optics, Neodymium, Manufacturing
SPIE Journal Paper | 2 August 2013
Hard disk drive thin film head manufactured using nanoimprint lithography
Daniel Sullivan, Thomas Boonstra, Mark Kief, Lily Youtt, Sethuraman Jayashankar, Carolyn Van Dorn, Harold Gentile, Sriram Viswanathan, Dexin Wang, Dion Song, Dongsung Hong, Sung-Hoon Gee
JM3, Vol. 12, Issue 03, 031105, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031105
KEYWORDS: Semiconducting wafers, Nanoimprint lithography, Optical lithography, Head, Thin films, Lithography, Manufacturing, Thin film manufacturing, Etching, Overlay metrology
Proceedings Article | 30 October 2007 Paper
The impact of mask photoresist develop on critical dimension parameters
Adam Smith, Daniel Sullivan, Kazuhiko Sugawara, Yusuke Okawa
Proceedings Volume 6730, 67300L (2007) https://doi.org/10.1117/12.747605
KEYWORDS: Critical dimension metrology, Photoresist developing, Photoresist materials, Photomasks, Photoresist processing, Chemically amplified resists, Metrology, Tolerancing, Industrial chemicals, Feature extraction
Proceedings Article | 20 October 2006 Paper
Chemical flare long-range proximity effects in photomask manufacturing with chemically amplified resists
Daniel Sullivan, Yusuke Okawa, Kazuhiko Sugawara, Zdenek Benes, Jun Kotani
Proceedings Volume 6349, 634905 (2006) https://doi.org/10.1117/12.686732
KEYWORDS: Photomasks, Modulation, Manufacturing, Chemically amplified resists, Industrial chemicals, Photoresist materials, Critical dimension metrology, Reactive ion etching, Photoresist processing, Standards development
Proceedings Article | 5 November 2005 Paper
Post coat delay effects on chemically amplified resists and storage condition impacts
Daniel Sullivan, Kenneth Racette, Monica Barrett, R. Brian Couture
Proceedings Volume 5992, 59920L (2005) https://doi.org/10.1117/12.631949
KEYWORDS: Thin film coatings, Critical dimension metrology, Compact discs, Chemically amplified resists, Photoresist materials, Opacity, Chromium, Standards development, Nitrogen, Quartz
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