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Delia Ristoiu
Senior Etch Engineer at STMicroelectronics SA
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Author
Publications (5)
Proceedings Article | 1 November 2022 Paper
OPC flow for non-conventional layouts: specific application to optical diffusers
Elodie Sungauer, Stephanie Audran, Simon Guillaumet, Delia Ristoiu
Proceedings Volume 12472, 124720T (2022) https://doi.org/10.1117/12.2639563
KEYWORDS: Optical proximity correction, Photomasks, SRAF, Etching, Sensors, Semiconducting wafers, Model-based design, Diffusers, Optical components, Resolution enhancement technologies
Proceedings Article | 23 March 2020 Presentation + Paper
A DOE study of plasma etched microlens shape for CMOS image sensors
Delia Ristoiu, François Leverd, Etienne Mortini, Jean-Luc Huguenin
Proceedings Volume 11326, 113260O (2020) https://doi.org/10.1117/12.2551857
KEYWORDS: Microlens, Etching, Plasma, Plasma etching, Lithography, CMOS sensors, Polymers, Image sensors
Proceedings Article | 22 May 2018 Paper
Integrated SiN on SOI dual photonic devices for advanced datacom solutions
Sylvain Guerber, Carlos Alonso-Ramos, Daniel Benedikovic, Diego Pérez-Galacho, Xavier Le Roux, Nathalie Vulliet, Sébastien Crémer, Laurène Babaud, Jonathan Planchot, Daniel Benoit, Paul Chantraine, François Leverd, Delia Ristoiu, Philippe Grosse, Delphine Marris-Morini, Laurent Vivien, Charles Baudot, Frédéric Boeuf
Proceedings Volume 10686, 106860W (2018) https://doi.org/10.1117/12.2306160
KEYWORDS: Silicon, Semiconducting wafers, Silicon photonics, Polarization, Waveguides, Coarse wavelength division multiplexing, Data communications, Photonic devices, Wave propagation, Wavelength division multiplexing
Proceedings Article | 16 July 2002 Paper
Productivity enhancements in recipe creation for overlay metrology measurements
Vincent Vachellerie, Delia Ristoiu, Alain Deleporte, Marc Poulingue, Yannick Bedin, Rolf Arendt, Ganesh Sundaram, Paul Knutrud
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473492
KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Time metrology, Optical alignment, Process control, Prototyping, Metals, Niobium, Semiconductors
Proceedings Article | 16 July 2002 Paper
Overlay metrology results on leading-edge Cu processes
Vincent Vachellerie, Delia Ristoiu, Alain Deleporte, Pierre-Olivier Sassoulas, Philippe Spinelli, Marc Poulingue, Pascal Fabre, Rolf Arendt, Ganesh Sundaram, Paul Knutrud
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473461
KEYWORDS: Overlay metrology, Semiconducting wafers, Copper, Image processing, Metals, Precision measurement, Pattern recognition, Detection and tracking algorithms, Metrology, Optical alignment
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