CONFERENCE PROCEEDINGS
Advanced Search
Dingyi Hong
at Siemens EDA
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 8 November 2021 Presentation + Paper
Optimizing curvilinear ILT recipe development with machine learning based pattern selection
Proceedings Volume 11855, 118550T (2021) https://doi.org/10.1117/12.2601918
KEYWORDS: Photomasks, Machine learning, Optical proximity correction, Data modeling, Lithography, Calibration, Semiconducting wafers, Printing, Fuzzy logic, Vector spaces
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top