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Heehwan Lee
at Samsung Display Co Ltd
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Publications (1)
Proceedings Article | 23 March 2020 Paper
A physics-driven complex valued neural network (CVNN) model for lithographic analysis
Proceedings Volume 11326, 113260I (2020) https://doi.org/10.1117/12.2551697
KEYWORDS: Machine learning, Neural networks, Lithography, Data modeling, Diffusion, Performance modeling, Image processing, Photomasks, Optical transfer functions, Image resolution
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