Dr. Hubertus Marbach Profile

Dr. Hubertus Marbach

at Carl Zeiss SMT GmbH

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Author

Publications (2)

SPIE Journal Paper | 7 September 2021 Open Access

Pushing the limits of EUV mask repair: addressing sub-10 nm defects with the next generation e-beam-based mask repair tool

Tilmann Heil, Michael Waldow, Renzo Capelli, Horst Schneider, Laura Ahmels, Fan Tu, Johannes Schöneberg, Hubertus Marbach

JM3, Vol. 20, Issue 03, 031013, (September 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.031013

KEYWORDS: Photomasks, Extreme ultraviolet, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet lithography, Scanners, Image processing, Cadmium, Manufacturing, Image analysis

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Proceedings Article | 6 October 2020 Presentation + Paper

High-end EUV photomask repairs for 5nm technology and beyond

Horst Schneider, Fan Tu, Laura Ahmels, Bartholomaeus Szafranek, Katharina Gries, Daniel Rhinow, Sebastian Vollmar, Andreas Krugmann, Ralf Schoenberger, Walter Pauls, Andreas Verch, Renzo Capelli, Alice Vincenzo, Grizelda Kersteen, Hubertus Marbach, Michael Waldow

Proceedings Volume 11518, 1151808 (2020) https://doi.org/10.1117/12.2572879

KEYWORDS: Extreme ultraviolet, Photomasks, Electron beams, Scanning electron microscopy, Semiconductors, Manufacturing, Extreme ultraviolet lithography, Lithography, Double patterning technology, Deep ultraviolet

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