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Hui-Chia Su
Student at National Tsing Hua Univ
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Publications (1)
Proceedings Article | 21 July 2004 Paper
Comparison between the atomic force microscopy and x-ray reflectivity on the characterization of the roughness of a surface
Hui-Chia Su, Ming-Zhe Lin, Tzu-Wen Huang, Chih-Hao Lee
Proceedings Volume 5392, (2004) https://doi.org/10.1117/12.539761
KEYWORDS: X-rays, Atomic force microscopy, Reflectivity, X-ray microscopy, Scattering, Surface roughness, Fractal analysis, X-ray characterization, Sapphire, Semiconducting wafers
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